Focused ion beam milling

FEI Quanta 3D Dual Beam FIB/SEM

Magnetic AND gate patterned into a carbon-capped 20 nm thick Co film on Si. The film has been milled through to the bare Si to produce a three-island structure of Co. The resolution achieved in the milling of the Co/C film is better than 50 nm

Focused Ion Beam (FIB) milling is capable of cutting away or building up structures on a surface with a resolution of about 50 nm (0.05 µm). It also has a scanning electron microscope so that the structures being created can be imaged in real time. It is ideal for making

  • patterned nanostructures
  • depth profiling
  • fault finding in microelectronic circuits
  • machining tiny slots and holes

Submit an enquiry 

If you are unsure of your requirements, please submit an enquiry using the link above. We can offer bespoke testing parameters tailored to your needs.

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Contact Details

College of Science and Engineering
Physics Building
University of Leicester 
Tel: 0116 252 3497